Ptychographic Ellipsometry
Abstract from patent: A method of determining optical property of a structure, comprising: obtaining first scattering data, the first scattering data relating to an illumination of the multi-layer structure with illumination radiation in a first polarization state and subsequently capturing radiation scattered from the multi-layer structure; reconstructing one or more first synthetic images of the multi-layer structure using the first scattering data, each of the one or more first synthetic images comprising amplitude and phase information of the radiation scattered from the multi-layer structure; and determining the optical property of the multi-layer structure using the one or more first synthetic images, wherein the optical property comprise complex refractive indices of one or more of the at least two layers of the multi-layer structure, and/or relative heights formed between the at least two layers of the multi-layer structure.Description still in process. In the meantime, please refer to the published patent.